회사소개
반도체장비
Panasonic
Plasma Equipment
Model ID | MD-P300 |
---|---|
Model No. | NM-EFF1C |
Productivity *1 |
C4:0.65s / IC(including dipping motion), Thermosonic:0.65s / IC(including US process time of 0.2s) |
Placement accuracy *1 |
XY(3σ at PFSC conditions):±5 µm |
Substrate dimensions | L 50 mm × W 50 mm to L 330 mm × W 330 mm (Heating specifications : L 330 mm × W 220 mm) |
Die dimensions | L 1 mm × W 1 mm to L 25 mm × W 25 mm ( Thermosonic : L7 mm × W 7 mm) |
Number of die types |
Up to 12 product types (AWC specifications) *1 nozzle type |
Die supply | Wafer frame 12 inches (Option:8 inches) |
Bonding load |
VCM head : 1N to 50 N (Option:2 N to 100 N) |
Head heating | Thermosonic : Up to 300℃ |
Substrate heating*2 | Constant heating, Up to 200℃ (Heating bonding stage specifications: Max. substrate size L 330 mm × W 220 mm) |
Power source *3 |
3-phase AC 200V ± 10V, 50/60 Hz, Up to 4 kVA (Up to 7 kVA for heating specification) |
Pneumatic source | 0.4 Mpa, 50L/min(A.N.R.) (Up to 150 L/min for full-featured machine including cooling air) |
Dimensions | W 1,380 mm × D 1,640 mm × H 1,430 mm ( without loader / unloader) |
Mass | 2,300 kg ( without loader / unloader) |